New photosensitive polymers based on MMA+PQ
- 1Institut für Angewandte Optik und Biophysik, Friedrich-Schiller-Universität Jena
- 2Institut für Physikalisch-chemische Probleme, Belarusian State University (Belarus)
dominik [dot] hoff [at] uni-jena [dot] de
We present a series of investigations of photopolymers based on Methylmethacrylate (MMA) and Phenanthrenequinone (PQ). The possibility to improve important properties of the polymers like thermal stability and adhesion on silica glass is shown. The examined PQ doped materials are Polymethylmethacrylate (PMMA), Co-Polymer of MMA+AA (AA-Acrylic acid), CP(MMA+MAA) (MAA-Methylmethacrylamide) and CP(MMA+MA) (MA-Methacrylic acid). The behavior of the diffraction efficiencies and the absorption spectra during illumination and baking is demonstrated. Furthermore the opportunity of storing holographic information is shown.
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@inproceedings{dgao110-p34,
title = {New photosensitive polymers based on MMA+PQ},
author = {Dominik Hoff, Elen Tolstik, Vladislav Matusevich, Richard Kowarschik, Yuri Matusevich, Leonid Krul, L. B. Yakimtsova},
booktitle = {DGaO-Proceedings, 110. Jahrestagung},
year = {2009},
publisher = {Deutsche Gesellschaft für angewandte Optik e.V.},
issn = {1614-8436},
note = {Poster P34}
}
110. Jahrestagung der DGaO · Brescia · 2009