Bulk and surface inhomogeneity of r.f. sputtered ITO films: an ellipsometric study

Anna Krasilnikova Sytchkova, Stefano Schutzmann
  1. Forschungszentrum Casaccia, Labor für optische Beschichtungen, Agenzia Nazionale per le Nuove Tecnologie, l'Energia e lo Sviluppo Economico Sostenibile (Italien)

annak [at] enea [dot] it

Tin-doped indium oxide (ITO) films have been prepared by r.f. sputtering technique in pure Ar and Ar+O2 atmospheres. Additional substrate heating during the deposition was used for a half of the samples. The influence of both deposition conditions and post-annealing treatment on film inhomogeneity was studied using multiangle spectroscopic ellipsometry. The structural and microstructural properties of the ITO films have been compared to the film inhomogeneity values.

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@inproceedings{krasilnikovasytchkova2009p27,
  author     = {Krasilnikova Sytchkova, Anna and Schutzmann, Stefano},
  title      = {{Bulk and surface inhomogeneity of r.f. sputtered ITO films: an ellipsometric study}},
  booktitle  = {DGaO-Proceedings 2009},
  series     = {DGaO-Proceedings},
  eventtitle = {110. Jahrestagung der DGaO},
  eventdate  = {2009-06-02/2009-06-05},
  venue      = {Brescia},
  publisher  = {Deutsche Gesellschaft für angewandte Optik e.V.},
  year       = {2009},
  pages      = {P27},
  url        = {https://dgao-proceedings.de/paper/110-p27}
}
110. Jahrestagung der DGaO · Brescia · 2009