Fabrication of resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining
- 1Laboratoire Hubert Curien, Université Jean Monnet (Frankreich)
- 2Leibniz-Institut für Oberflächenmodifizierung e.V.
- 3Georgi-Nadjakov-Institut für Festkörperphysik, Bulgarische Akademie der Wissenschaften (Bulgarien)
- 4Prochorow-Institut für Allgemeine Physik der Russischen Akademie der Wissenschaften (Russland)
renate [dot] fechner [at] iom-leipzig [dot] de
Top hat diffraction efficiency in an all-dielectric SiO2/HfO2 grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining. The Poster shows the design, fabrication and the diffraction efficiency results of the element focusing on the fabrication details.
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@inproceedings{parriaux2007p44,
author = {Parriaux, Olivier and Fechner, Renate and Flury, Manuel and Tonchev, Svetlen and Lyndin, Nikolay and Schindler, Axel},
title = {{Fabrication of resonant grating pulse compression element with 99\% flat top efficiency for high average power femtosecond laser machining}},
booktitle = {DGaO-Proceedings 2007},
series = {DGaO-Proceedings},
eventtitle = {108. Jahrestagung der DGaO},
eventdate = {2007-05-30/2007-06-02},
venue = {Heringsdorf},
publisher = {Deutsche Gesellschaft für angewandte Optik e.V.},
year = {2007},
pages = {P44},
url = {https://dgao-proceedings.de/paper/108-p44}
}
108. Jahrestagung der DGaO · Heringsdorf · 2007