Fabrication of resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining

  1. 1Hubert Curien Laboratory, Université Jean Monnet
  2. 2Leibniz-Institut für Oberflächenmodifizierung e.V., Leibniz Institute of Surface Engineering
  3. 3Georgi-Nadjakov-Institut für Festkörperphysik, Bulgarische Akademie der Wissenschaften, Georgi Nadjakov Institute of Solid State Physics, Bulgarian Academy of Sciences
  4. 4Prochorow-Institut für Allgemeine Physik der Russischen Akademie der Wissenschaften, Prokhorov General Physics Institute of the Russian Academy of Sciences

renate.fechner@iom-leipzig.de

Top hat diffraction efficiency in an all-dielectric SiO2/HfO2 grating femtosecond pulse compression grating is demonstrated with a close to 100% flat top over more than 20 nm around 800 nm wavelength. New perspectives are open for high average power femtosecond laser machining. The Poster shows the design, fabrication and the diffraction efficiency results of the element focusing on the fabrication details.

Manuscript not yet submitted. The submission phase is currently closed.
@inproceedings{dgao108-p44, title = {Fabrication of resonant grating pulse compression element with 99% flat top efficiency for high average power femtosecond laser machining}, author = {Olivier Parriaux, Renate Fechner, Manuel Flury, Svetlen Tonchev, Nikolay Lyndin, Axel Schindler}, booktitle = {DGaO-Proceedings, 108. Jahrestagung}, year = {2007}, publisher = {Deutsche Gesellschaft für angewandte Optik e.V.}, issn = {1614-8436}, note = {Poster P44} }
108. Annual Conference of the DGaO · Heringsdorf · 2007