Martin Steglich
Carl Zeiss Jena GmbH
Institute of Applied Physics, Friedrich Schiller University Jena
4 papers
A18 · Talk · 125. Conference (2024)
Hochauflösende EUV-Gitter durch 2D-Phasenkorrektur in der Linienverteilung
B30 · Talk · 123. Conference (2022)
Abbildende holografische EUV-Gitter
A31 · Talk · 120. Conference (2019)
Si-microstructures for back-illuminated Ge-on-Si photodetectors
B15 · Talk · 120. Conference (2019)