Uwe Zeitner
Fraunhofer-Institut für Angewandte Optik und Feinmechanik IOF, Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Institute of Applied Physics, Friedrich Schiller University Jena
3 papers
A31 · Talk · 120. Conference (2019)
Si-microstructures for back-illuminated Ge-on-Si photodetectors
P17 · Poster · 112. Conference (2011)
Modellierung und Simulation bei Mask Aligner Lithographie (Source-Mask Optimization
C20 · Talk · 110. Conference (2009)